SYSTEM CONFIGURATION
- I-GUN TYPE : 5nm column Next gen
- E-GUN TYPE : N/A
- BEAM CURRENT : 3pA~931pA(50KV)
- DEPO SYSTEM : Tungsten, Tmcts, O2, H2O, Cl2(or Br2), XeF2
- VACUUM TYPE : Turbomolecular Pump, Mechanical Pump*2, Ion Getter pump*2
- STAGE TYPE : OBIC Laser 200mm*200mm
- LOADLOCK TYPE : Loadlock system
- PS/OS : IBM RISC System/6000 43P model 150
- DERECTOR : MCP
*The system is operating in Taiwan Service lab supporting FA milling and circuit editing jobs.